The fundamental physical parameter of both bulk and low-dimensional semiconductor structures is the band gap \(\left({E}_{g}^{3d},{E}_{g}^{2d}\right)\) , whose energetic width allows the prediction of the operational parameters of semiconductor-based devices in advance. Therefore, the determination of \({E}_{g}^{3d}\) and \({E}_{g}^{2d}\) (in cases where the band gap of newly synthesized materials is not known) is considered one of the primary tasks in semiconductor heterostructure technology. Furthermore, another important feature of \({E}_{g}\) is its strong sensitivity to external influences. Indeed, variations in \({E}_{g}\) resulting from such effects can fundamentally alter the physical and chemical properties of semiconductor devices.