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<p>Results are given for a complex study of thin Nb<sub>2</sub>O<sub>5</sub> films deposited in vacuum (<i>p</i> = 2.2 Pa) on quartz and silicon substrates using multi-pulse high-frequency laser action (<i>f</i> ~ 10–12 kHz) on a ceramic target with laser power density <i>q</i> = 81 MW/cm<sup>2</sup>. The morphology of these films was studied using atomic force microscopy. Features of the transmission spectra were presented. The photoelectrical properties of the Nb<sub>2</sub>O<sub>5</sub>/Si structure were analyzed.</p>

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Surface Morphology, Optical Characteristics and Electrophysical Properties of Nb2O5 Films

  • 期刊论文

  • 发表日期：

    2025年9月11日

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  • N. A. Bosak,
  • P. V. Shpak,
  • A. N. Chumakov,
  • L. V. Baran,
  • V. V. Malutina-Bronskaya,
  • V. S. Drobush,
  • A. S. Kuzmitskaya

摘要

Results are given for a complex study of thin Nb2O5 films deposited in vacuum (p = 2.2 Pa) on quartz and silicon substrates using multi-pulse high-frequency laser action (f ~ 10–12 kHz) on a ceramic target with laser power density q = 81 MW/cm2. The morphology of these films was studied using atomic force microscopy. Features of the transmission spectra were presented. The photoelectrical properties of the Nb2O5/Si structure were analyzed.