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<p>The phase response of a new polymer with anthracene side-groups was shown experimentally to be created by their photooxidation and photodimerization. Both photoreactions lead to approximately equal photorefraction in the volume of the material (∆<i>n</i> ≈ –0.02 for λ = 633 nm) and formation of a photorelief on the layer surface. Estimation of the refractive index modulation depth in the structure of the two-dimensional holographic gratings indicates the possibility of achieving maximum diffraction efficiency, which is limited for three-dimensional gratings by their nonsinusoidality. This polymer and its compositions with various photosensitizers in thin (~1 μm) layers were shown to effectively form surface photoreliefs with spatial frequency up to 1000 mm<sup>–1</sup> and amplitude up to 25% of the layer thickness when using post-exposure reversible plasticization. Our experiments showed that the resistance of the surface reliefs to the action of temperatures above 90oC can be increased manyfold by photocross-linking the material of the formed relief material.</p>

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Photosensitive Polymer Material for Volume and Relief Phase Holographic Recording in a Wide Spectral Range

  • 期刊论文

  • 发表日期：

    2025年5月30日

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  • U. V. Mahilny,
  • D. E. Stasevich,
  • E. A. Khramtsou,
  • A. P. Shkadarevich

摘要

The phase response of a new polymer with anthracene side-groups was shown experimentally to be created by their photooxidation and photodimerization. Both photoreactions lead to approximately equal photorefraction in the volume of the material (∆n ≈ –0.02 for λ = 633 nm) and formation of a photorelief on the layer surface. Estimation of the refractive index modulation depth in the structure of the two-dimensional holographic gratings indicates the possibility of achieving maximum diffraction efficiency, which is limited for three-dimensional gratings by their nonsinusoidality. This polymer and its compositions with various photosensitizers in thin (~1 μm) layers were shown to effectively form surface photoreliefs with spatial frequency up to 1000 mm–1 and amplitude up to 25% of the layer thickness when using post-exposure reversible plasticization. Our experiments showed that the resistance of the surface reliefs to the action of temperatures above 90oC can be increased manyfold by photocross-linking the material of the formed relief material.