Critical impact of inter-electrode spacing on RF discharge dynamics in ICP plasma reactors: strategies for enhanced plasma performance
摘要
The electrode spacing in radio frequency (RF) plasma reactors, particularly in inductively coupled plasma (ICP) systems, significantly influences plasma characteristics and performance. This study investigates the impact of inter-electrode distance on plasma parameters and processing outcomes. The electrode separation directly affects electron density, electron temperature, and plasma uniformity. Optimal electrode spacing is critical for maintaining a stable and uniform plasma across the processing area. Changes in the electrode gap alter plasma impedance, which in turn affects power coupling efficiency and overall plasma behavior. Understanding and optimizing inter-electrode distance in RF-driven ICP reactors is essential for controlling plasma properties and achieving desired outcomes in plasma processing applications such as etching, deposition, and surface modification.