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<p>The development of high-performance depth-graded multilayer coatings is critical for next-generation hard X-ray astronomical telescopes, such as the proposed Wide-band X-ray Polarization Telescope (WXPT) mission. This work focuses on the fabrication and performance evaluation of W/Si depth-graded multilayers designed for WXPT. The coatings were deposited using a custom-built linear direct-current magnetron sputtering system. Grazing-incidence X-ray reflectometry (XRR) and cross-sectional transmission electron microscopy (TEM) revealed consistently smooth interfaces with widths of approximately 0.3-0.4 nm, demonstrating exceptional layer uniformity and minimal cumulative roughening even over hundreds of layers. Atomic force microscopy confirmed the ultra-smooth surface morphology (RMS roughness &lt; 0.3 nm) of the final coatings. The critical impact of substrate roughness on multilayer reflectivity was quantitatively demonstrated. Most importantly, hard X-ray reflectivity measurements, both from a laboratory source and synchrotron radiation, showed excellent agreement with theoretical simulations assuming an interface width of <InlineEquation ID="IEq1"> <EquationSource Format="TEX">\(\sigma \)</EquationSource> </InlineEquation> = 0.4 nm. The coatings achieved high reflectivity across a broad energy band (e.g., &#xa0;25% at 20-30 keV for a design optimized for <InlineEquation ID="IEq2"> <EquationSource Format="TEX">\(0.3^\circ \)</EquationSource> </InlineEquation> incidence), successfully meeting the performance targets. These results establish a robust and reliable fabrication pathway for producing high-quality W/Si multilayers, marking a significant step towards their application in Silicon Pore Optics (SPO) for the WXPT mission.</p>

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Deposition and performance of depth-graded W/Si multilayers on silicon pore optics for the WXPT mission

  • 期刊论文

  • 发表日期：

    2026年7月1日

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  • Zeying Cai,
  • Zhuo Li,
  • Zhengwei Li,
  • Jun Xiong,
  • Liqiang Qi,
  • Zhongliang Li,
  • Congzhan Liu,
  • Lin Li,
  • Shuaiwei Li,
  • Shun Xia,
  • Guoxiang Deng,
  • Na Gao,
  • Qianqing Yin,
  • Haoxuan Gao,
  • Xin Huang,
  • Le Kang,
  • Tianxiang Chen

摘要

The development of high-performance depth-graded multilayer coatings is critical for next-generation hard X-ray astronomical telescopes, such as the proposed Wide-band X-ray Polarization Telescope (WXPT) mission. This work focuses on the fabrication and performance evaluation of W/Si depth-graded multilayers designed for WXPT. The coatings were deposited using a custom-built linear direct-current magnetron sputtering system. Grazing-incidence X-ray reflectometry (XRR) and cross-sectional transmission electron microscopy (TEM) revealed consistently smooth interfaces with widths of approximately 0.3-0.4 nm, demonstrating exceptional layer uniformity and minimal cumulative roughening even over hundreds of layers. Atomic force microscopy confirmed the ultra-smooth surface morphology (RMS roughness < 0.3 nm) of the final coatings. The critical impact of substrate roughness on multilayer reflectivity was quantitatively demonstrated. Most importantly, hard X-ray reflectivity measurements, both from a laboratory source and synchrotron radiation, showed excellent agreement with theoretical simulations assuming an interface width of \(\sigma \) = 0.4 nm. The coatings achieved high reflectivity across a broad energy band (e.g.,  25% at 20-30 keV for a design optimized for \(0.3^\circ \) incidence), successfully meeting the performance targets. These results establish a robust and reliable fabrication pathway for producing high-quality W/Si multilayers, marking a significant step towards their application in Silicon Pore Optics (SPO) for the WXPT mission.