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<p>Chili anthracnose, caused by the seed-borne pathogen <i>Colletotrichum capsici</i>, is a major disease responsible for considerable economic losses. This study investigated the effects of dielectric barrier discharge (DBD) plasma on <i>C. capsici</i> inhibition and quality of seeds of three chili cultivars consisting of <i>Capsicum annumm</i> cv. Bang Chang, <i>C. frutescens</i> cv. Khee Noo Suan and <i>Capsicum annumm</i> cv. Noom Khaew. DBD plasma exposure for 10–30&#xa0;min suppressed fungal growth, achieving complete (100%) inhibition at 30&#xa0;min, while conidial germination was fully inhibited at all exposure durations. Microscopic and scanning electron microscope (SEM) revealed hyphal collapse and conidial deformation, confirming fungal inactivation. Among chili cultivars, Bang Chang cultivar responded best, showing enhanced germination and a reduced disease incidence of 1–3% compared with 24% in the inoculated control. In contrast, the Khee Noo Suan cultivar showed no improvement, whereas the Noom Khaew cultivar maintained high germination with minimal plasma response. SEM imaging demonstrated cultivar-dependent seed coat changes, from mild roughening at short exposures to severe etching at longer durations. Hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>) accumulation in seeds increased with exposure time, indicating elevated oxidative activity. Overall, DBD plasma effectively inactivated <i>C. capsici</i> and improved seed surface characteristics, demonstrating its potential as a non-chemical seed disinfection and enhancement technology for chili production.</p>

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The effect of non-thermal dielectric barrier discharge plasma on the disinfestation of chili seeds from the pathogen Colletotrichum capsici

  • 期刊论文

  • 发表日期：

    2026年4月11日

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  • Piyanath Pakamas,
  • Natthapong Pumaon,
  • Dheerawan Boonyawan,
  • Salit Supakitthanakorn

摘要

Chili anthracnose, caused by the seed-borne pathogen Colletotrichum capsici, is a major disease responsible for considerable economic losses. This study investigated the effects of dielectric barrier discharge (DBD) plasma on C. capsici inhibition and quality of seeds of three chili cultivars consisting of Capsicum annumm cv. Bang Chang, C. frutescens cv. Khee Noo Suan and Capsicum annumm cv. Noom Khaew. DBD plasma exposure for 10–30 min suppressed fungal growth, achieving complete (100%) inhibition at 30 min, while conidial germination was fully inhibited at all exposure durations. Microscopic and scanning electron microscope (SEM) revealed hyphal collapse and conidial deformation, confirming fungal inactivation. Among chili cultivars, Bang Chang cultivar responded best, showing enhanced germination and a reduced disease incidence of 1–3% compared with 24% in the inoculated control. In contrast, the Khee Noo Suan cultivar showed no improvement, whereas the Noom Khaew cultivar maintained high germination with minimal plasma response. SEM imaging demonstrated cultivar-dependent seed coat changes, from mild roughening at short exposures to severe etching at longer durations. Hydrogen peroxide (H2O2) accumulation in seeds increased with exposure time, indicating elevated oxidative activity. Overall, DBD plasma effectively inactivated C. capsici and improved seed surface characteristics, demonstrating its potential as a non-chemical seed disinfection and enhancement technology for chili production.