Influence of the anatase/rutile phase ratio on the photoresponse of TiO2 thin films
摘要
In this work, TiO₂ thin films were fabricated on a gold-interdigitated silicon substrate by electrochemical anodization. The samples were annealed in air for 6 h at 450 °C and 550 °C, obtaining the coexistence of the anatase and rutile phases. The influence of the anatase/rutile phases ratio on the photoresponse at different wavelengths was analyzed. The optical and electrical properties, as well as the morphology of the TiO₂ thin film, were studied by scanning electron microscopy, X-ray diffraction, impedance spectroscopy, and UV–vis spectroscopy. Unlike most TiO₂ films, which exhibit good photoresponse only in UV light, we were able to extend the photoresponse to a wide range of wavelengths. Controlling the ratio of the anatase/rutile phases by annealing temperature significantly improved the sensitivity of the thin film. It was observed that the sample with approximately 80% anatase phase by weight exhibited a better photoresponse than the sample with a reduced anatase value of 25%. In particular, sensitivity increased by an order of magnitude.