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<p>In this study, a kinetic and morphological study about the palladium (Pd) electrodeposition onto an Indium Tin Oxide (ITO) glass electrode was investigated. The electrodeposition was carried out in a plating bath containing 0.01&#xa0;M PdCl₂ and 1&#xa0;M KCl at pH 6. The predominance diagrams showed that the dominant chemical species was PdCl₄<sup>2</sup>⁻. Chronoamperometry was employed to analyze the kinetics of Pd electrodeposits within the potential range of -0.300 to -0.650&#xa0;V, revealing a progressive nucleation process with high nucleation rate values. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) techniques were employed to characterize Pd electrodeposits on the ITO substrate. At a potential of -0.350&#xa0;V, dispersed Pd particles were observed, whereas at -0.450&#xa0;V, the particle density increased. At -0.550&#xa0;V, a homogeneous deposit was formed, resulting from the overlapping of Pd nuclei.</p>

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Kinetic and morphological study of palladium electrodeposits onto indium tin oxide (ITO) substrates

  • 期刊论文

  • 发表日期：

    2025年3月26日

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  • Luis Humberto Mendoza-Huizar

摘要

In this study, a kinetic and morphological study about the palladium (Pd) electrodeposition onto an Indium Tin Oxide (ITO) glass electrode was investigated. The electrodeposition was carried out in a plating bath containing 0.01 M PdCl₂ and 1 M KCl at pH 6. The predominance diagrams showed that the dominant chemical species was PdCl₄2⁻. Chronoamperometry was employed to analyze the kinetics of Pd electrodeposits within the potential range of -0.300 to -0.650 V, revealing a progressive nucleation process with high nucleation rate values. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) techniques were employed to characterize Pd electrodeposits on the ITO substrate. At a potential of -0.350 V, dispersed Pd particles were observed, whereas at -0.450 V, the particle density increased. At -0.550 V, a homogeneous deposit was formed, resulting from the overlapping of Pd nuclei.