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<p>Precision positioning stage is the key component of the micro-nano manufacturing system influencing the fabricating quality and efficiency. This paper proposes a two-degree-of-freedom (2-DOF) stick-slip actuated nanopositioning stage exhibiting millimeter-per-second-scale motion speed, nano-scale motion resolution and consistent dual-axis dynamic performance. A novel spatial parallelogram-lever mechanism (SPLM) with large moving step is developed as the driving mechanism of the stage. A hybrid decoupled structure that combines the parallelly decoupled driving mechanism with serially configured guideways is applied to achieve consistent dual-axis performance of the stage. The coarse-fine actuation principle is adopted to balance the contradiction between motion stroke and precision. The characteristics analysis model is conducted through the chain-based compliance matrix method, and the dominant parameters optimization of the SPLM is achieved. The prototype is fabricated, and the performance of the stage is tested. The results show that the velocities of the two axes are basically the same, with maximum velocities of 3.21&#xa0;mm/s and 3.17&#xa0;mm/s, respectively. The cross-coupling rates along X-axis and Y-axis are 0.39% and 0.95%, respectively. The dual-axis closed-loop motion resolution is 10&#xa0;nm. Finally, probe processing experiments are carried out. The results demonstrate that the proposed stage can realize the large-stroke processing of one-dimensional and two-dimensional grooves, which provides advantages for micro-nano manufacturing.</p>

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A dual-axis nanopositioning stage with high biaxial consistency based on spatial parallelogram-lever mechanism

  • 期刊论文

  • 发表日期：

    2026年5月13日

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  • Fujun Wang,
  • Dongji Piao,
  • Beichao Shi,
  • Jianhua Dai,
  • Cunman Liang,
  • Yanling Tian

摘要

Precision positioning stage is the key component of the micro-nano manufacturing system influencing the fabricating quality and efficiency. This paper proposes a two-degree-of-freedom (2-DOF) stick-slip actuated nanopositioning stage exhibiting millimeter-per-second-scale motion speed, nano-scale motion resolution and consistent dual-axis dynamic performance. A novel spatial parallelogram-lever mechanism (SPLM) with large moving step is developed as the driving mechanism of the stage. A hybrid decoupled structure that combines the parallelly decoupled driving mechanism with serially configured guideways is applied to achieve consistent dual-axis performance of the stage. The coarse-fine actuation principle is adopted to balance the contradiction between motion stroke and precision. The characteristics analysis model is conducted through the chain-based compliance matrix method, and the dominant parameters optimization of the SPLM is achieved. The prototype is fabricated, and the performance of the stage is tested. The results show that the velocities of the two axes are basically the same, with maximum velocities of 3.21 mm/s and 3.17 mm/s, respectively. The cross-coupling rates along X-axis and Y-axis are 0.39% and 0.95%, respectively. The dual-axis closed-loop motion resolution is 10 nm. Finally, probe processing experiments are carried out. The results demonstrate that the proposed stage can realize the large-stroke processing of one-dimensional and two-dimensional grooves, which provides advantages for micro-nano manufacturing.