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<p>The study of hafnium dioxide (HfO<sub>2</sub>) thin films has grown significantly, driven by the demand for materials with excellent optical and corrosion-resistant properties. Because of its high refractive index, transparency, and chemical stability, it has long been an appealing entrant for high-performance coatings. In this work, we use electron beam evaporation to deposit the HfO<sub>2</sub> thin films sequentially and to discover their influence on the structural, morphological, optical, and corrosion behavior. These characteristics were analyzed with the help of XRD, FESEM, UV-Vis-NIR spectrophotometer, and potentiodynamic curves. The films exhibit excellent optical transparency (Transmittance ~ 87%) across a wide visible range of wavelengths. The refractive index at 550&#xa0;nm was in the range of 1.95–2.15, and a low extinction coefficient confirmed the quality of the films, reflecting their dense and uniform structure. The protective nature of the film was studied by the electrochemical corrosion behavior in a 3.5 wt% NaCl environment, showing lower current densities (i<sub>corr</sub> = 0.094 ± 0.003 µAcm<sup>−2</sup>) and higher electro-potential compared to bare samples, resulted in reducing the degradation rate of the base materials. A correlation was established between the contact angle measurements and the corrosion resistance of the bare and coated samples. This behavior highlights their potential as optical and protective coatings in anti-reflection, marine, and other technological applications.</p>

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Effect of deposition conditions on the morphological, optical, and corrosion behavior of electron beam evaporated high-performance HfO2 thin films

  • 期刊论文

  • 发表日期：

    2025年7月14日

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  • Shashi Kant,
  • Neelam Kumari,
  • Mukesh Kumar

摘要

The study of hafnium dioxide (HfO2) thin films has grown significantly, driven by the demand for materials with excellent optical and corrosion-resistant properties. Because of its high refractive index, transparency, and chemical stability, it has long been an appealing entrant for high-performance coatings. In this work, we use electron beam evaporation to deposit the HfO2 thin films sequentially and to discover their influence on the structural, morphological, optical, and corrosion behavior. These characteristics were analyzed with the help of XRD, FESEM, UV-Vis-NIR spectrophotometer, and potentiodynamic curves. The films exhibit excellent optical transparency (Transmittance ~ 87%) across a wide visible range of wavelengths. The refractive index at 550 nm was in the range of 1.95–2.15, and a low extinction coefficient confirmed the quality of the films, reflecting their dense and uniform structure. The protective nature of the film was studied by the electrochemical corrosion behavior in a 3.5 wt% NaCl environment, showing lower current densities (icorr = 0.094 ± 0.003 µAcm−2) and higher electro-potential compared to bare samples, resulted in reducing the degradation rate of the base materials. A correlation was established between the contact angle measurements and the corrosion resistance of the bare and coated samples. This behavior highlights their potential as optical and protective coatings in anti-reflection, marine, and other technological applications.