The effect of Ni2+ and Co2+ dopants on the structural, electrical and optical properties of Sn2-x-yNixCoyO2-zFz thin films
摘要
Transparent conductive oxides (TCOs) play a crucial role in the development of optoelectronic and photovoltaic devices due to their high electrical conductivity and optical transparency. Among the various TCOs, SnO2 thin films doped with different elements have shown promise in this regard. This study investigates the structural, electrical, and optical properties of undoped SnO2 and SnO2 thin films co-doped with F−, Ni2+, and Co2+. These films were deposited using the spray pyrolysis method on the glass substrate. To characterize the effects of doping on the structural, electrical and optical properties of the films, X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), UV–visible spectroscopy, and the 4-point probe method were employed. XRD results indicated that all films displayed a tetragonal rutile structure. Notably, the introduction of doping elements did not affect the preferred orientation relative to the (200) plane. Nevertheless, the addition of cationic dopants led to a minor increase in the Bragg angle. FE-SEM micrographs displayed a compact morphology with pyramid-shaped particles. UV–visible spectroscopy was used to determine the transmittance of the films within the wavelength range of 400 to 700 nm. The results showed that the incorporation of Ni2+ and Co2+ into the SnO2 film increased the average transparency from 84% (undoped SnO2) to 88.8% (co-doped film with 3% Co2+, 1% Ni2+, and 20% F−). Additionally, the presence of these dopants led to a reduction in the electrical resistivity of the films from 137 Ω/□ for undoped SnO2 to 6 Ω/□, as measured by the 4-point probe method.