Demonstration of low contact resistance in SiC using high-repetition-rate KrF excimer laser irradiation
摘要
We demonstrated laser doping of silicon carbide (SiC) with a KrF excimer laser at a high repetition rate of 4000 Hz to improve throughput. As an n-type dopant source, a silicon nitride (SiN) film with a thickness of 100 nm was deposited onto the SiC surface before irradiation. Secondary-ion mass spectroscopy revealed that the nitrogen concentration in SiC exceeded 1021 cm-3. Scanning transmission electron microscopy and energy-dispersive X-ray spectroscopy revealed a SiOx layer and graphite on the SiC surface after irradiation. Amorphous Si was present beneath the SiOx layer, while the SiN film was not present. Although contrast change was observed in the SiC, the bottom part maintained the crystalline structure. The specific contact resistance was also measured. Its minimum value was 1.0 × 10− 5 cm2. We report the results of laser doping in terms of surface conditions and specific contact resistance.