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<p>Fabricating antireflection microstructures on zinc sulfide optical windows can significantly enhance optical performance and environmental reliability. Laser direct writing technology, with its advantages such as no need for masks, high flexibility, and non-contact processing, has become an ideal choice for the preparation of antireflection microstructures. Thus, in this paper, to obtain a ZnS surface with ultra-low reflectivity, three different anti-reflection microstructure types with hole arrays, groove arrays and grid arrays were fabricated on the surface of ZnS by using a femtosecond laser direct writing technology. The results showed that with optimized microstructure and processing parameters, the average reflectivity of the ZnS with anti-reflection microstructure was only 1/4 of that of the ZnS without surface microstructure. The average reflectivity of the ZnS with grid array microstructure was the lowest with value of only 3.65%, which was about 1/3 and 3/4 of that of the hole array and groove arrays, respectively. The results also indicated that with appropriate microstructural depth and roughness on the surface of the ZnS, low reflectivity with value of 2.32% was obtained. The effect of the processing speed and laser power of the femtosecond laser direct writing process on the microstructural depth and roughness on the surface of the ZnS were also investigated in details. Additionally, the influence of the period of the microstructure on the reflectivity of the ZnS was also analyzed. The relevant investigated results presented theoretical basis and data support for the efficient fabrication of anti-reflection artificial microstructure.</p>

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Fabrication of artificial microstructure arrays with low surface reflectivity on ZnS by femtosecond laser direct writing

  • 期刊论文

  • 发表日期：

    2025年5月22日

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  • Yongguo Wang,
  • Zheng Hu,
  • Jiecai Feng,
  • Ze Tian,
  • Bingdong Yang,
  • Xiaohao Dong,
  • Cuilian Xu,
  • Hongfei Liu,
  • Yilian Zhang,
  • Yingzhong Tian

摘要

Fabricating antireflection microstructures on zinc sulfide optical windows can significantly enhance optical performance and environmental reliability. Laser direct writing technology, with its advantages such as no need for masks, high flexibility, and non-contact processing, has become an ideal choice for the preparation of antireflection microstructures. Thus, in this paper, to obtain a ZnS surface with ultra-low reflectivity, three different anti-reflection microstructure types with hole arrays, groove arrays and grid arrays were fabricated on the surface of ZnS by using a femtosecond laser direct writing technology. The results showed that with optimized microstructure and processing parameters, the average reflectivity of the ZnS with anti-reflection microstructure was only 1/4 of that of the ZnS without surface microstructure. The average reflectivity of the ZnS with grid array microstructure was the lowest with value of only 3.65%, which was about 1/3 and 3/4 of that of the hole array and groove arrays, respectively. The results also indicated that with appropriate microstructural depth and roughness on the surface of the ZnS, low reflectivity with value of 2.32% was obtained. The effect of the processing speed and laser power of the femtosecond laser direct writing process on the microstructural depth and roughness on the surface of the ZnS were also investigated in details. Additionally, the influence of the period of the microstructure on the reflectivity of the ZnS was also analyzed. The relevant investigated results presented theoretical basis and data support for the efficient fabrication of anti-reflection artificial microstructure.