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<p>This study analyzes the RF and DC characteristics of a novel α-Ga<sub>2</sub>O<sub>3</sub> (Gallium oxide) MOSFET (Metal oxide semiconductor field effect transistor) featuring ultra-wide bandgap Magnesium Oxide (MgO) and Calcium Oxide (CaO) back barriers using Atlas TCAD 2D simulations. The main contribution of this work lies in demonstrating the effectiveness of using MgO and CaO as back barriers to significantly enhance electron confinement, improve electron mobility, and boost RF performance (f<sub>T</sub> and f<sub>Max</sub>) in α-Ga<sub>2</sub>O<sub>3</sub> MOSFETs, which addresses key limitations observed in conventional designs. The device incorporates a high-k Hafnium oxide (HfO<sub>2</sub>) dielectric layer to minimize gate leakage current. Additionally, the MgO back barrier serves to confine electrons to the Si-doped α-Ga<sub>2</sub>O<sub>3</sub> channel, improving electron mobility and enhancing the overall RF performance. The proposed HfO<sub>2</sub>/α-Ga<sub>2</sub>O<sub>3</sub>/MgO/Sapphire MOSFET demonstrates a peak drain-to-source current (I<sub>DS</sub> max) of 42 mA/mm, a high transconductance factor (g<sub>m</sub>) of 520 mS/mm, and a large output conductance of 5.7 mΩ⁻<sup>1</sup>/mm. The device exhibits a significant improvement in RF performance with an f<sub>T</sub> of 5.8 GHz and f<sub>Max</sub> of 13 GHz compared to conventional α-Ga<sub>2</sub>O<sub>3</sub> MOSFETs. Furthermore, the device shows a remarkable I<sub>ON</sub>/I<sub>OFF</sub> ratio of 9.8×10⁶, an electric field of 3.3 MV/cm, and a transit angular frequency of 22.5 GHz. These results suggest that the HfO<sub>2</sub>/α-Ga<sub>2</sub>O<sub>3</sub>/MgO/Sapphire-based MOSFET is a promising candidate for future high-speed and high-power electronic applications.</p>

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Enhancement of fMAX/fT in α-Ga2O3 MOSFET with ultra-wide bandgap MgO and CaO blocking layers

  • 期刊论文

  • 发表日期：

    2025年4月23日

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  • A. S. Augustine Fletcher,
  • P. Murugapandiyan,
  • A. Mohanbabu,
  • S. Dhanasekar,
  • G. Saranya

摘要

This study analyzes the RF and DC characteristics of a novel α-Ga2O3 (Gallium oxide) MOSFET (Metal oxide semiconductor field effect transistor) featuring ultra-wide bandgap Magnesium Oxide (MgO) and Calcium Oxide (CaO) back barriers using Atlas TCAD 2D simulations. The main contribution of this work lies in demonstrating the effectiveness of using MgO and CaO as back barriers to significantly enhance electron confinement, improve electron mobility, and boost RF performance (fT and fMax) in α-Ga2O3 MOSFETs, which addresses key limitations observed in conventional designs. The device incorporates a high-k Hafnium oxide (HfO2) dielectric layer to minimize gate leakage current. Additionally, the MgO back barrier serves to confine electrons to the Si-doped α-Ga2O3 channel, improving electron mobility and enhancing the overall RF performance. The proposed HfO2/α-Ga2O3/MgO/Sapphire MOSFET demonstrates a peak drain-to-source current (IDS max) of 42 mA/mm, a high transconductance factor (gm) of 520 mS/mm, and a large output conductance of 5.7 mΩ⁻1/mm. The device exhibits a significant improvement in RF performance with an fT of 5.8 GHz and fMax of 13 GHz compared to conventional α-Ga2O3 MOSFETs. Furthermore, the device shows a remarkable ION/IOFF ratio of 9.8×10⁶, an electric field of 3.3 MV/cm, and a transit angular frequency of 22.5 GHz. These results suggest that the HfO2/α-Ga2O3/MgO/Sapphire-based MOSFET is a promising candidate for future high-speed and high-power electronic applications.