<p>In recent years, hafnium nitride films have demonstrated remarkable potential in numerous fields on account of their stability and resistance properties. In this study, a series of Hf-N films were fabricated by magnetron sputtering technology. The impacts of the Ar/N₂ ratio on the micro-morphology and microstructure of the films were investigated, and the relationship between the film properties and its microstructure was further analyzed. It was observed that the surface morphology of the Hf-N films, which grew in a columnar crystal form, became denser with the elevation of the Ar/N₂ ratio. When the Ar/N₂ ratio was increased to 50:2.5, the composition of the film transformed into a single HfN phase, and this single-phase composition remained unaltered within a wide range of nitrogen flow. We discovered that the compressive stress and texture coefficient significantly contributed to enhancing the nanohardness of the films. Specifically, when the Ar/N₂ ratio was 50:2.5, the film exhibited a maximum hardness value of 28.4 GPa along with an elastic recovery value of up to 63.1%. After undergoing high-temperature oxidation, the film maintained a stable structure and possessed good oxidation resistance. Moreover, its corrosion resistance was two orders of magnitude higher than that of the substrate material.</p>