Current status of diamond surface polishing technology
摘要
Surface defects and irregularities in diamond affect its application in ultra-precision fields, making it essential to improve diamond surface quality. This paper discusses various diamond polishing methods by introducing the mechanisms of micro-crushing removal, graphitization removal, chemical reaction removal, evaporation removal, and sputtering removal. It analyzes the machining accuracy, material removal rate, and processing methods associated with different polishing approaches. It has been discovered that mechanical polishing can achieve micron-level precision on diamond surfaces, while ion beam polishing can reach sub-nanometer levels. Composite polishing combines the advantages of different polishing methods to achieve high-precision, high-efficiency polishing of diamond surfaces. Future diamond polishing methods will evolve toward multi-method composite polishing, such as mechanical and thermochemistry composite polishing. This will further refine methods in the diamond polishing field, enabling the processing of ultra-smooth diamond surfaces while advancing polishing methods toward greater environmental sustainability.