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<p>Direct electrochemical printing of nickel MEMS components is one of the promising options for improvement, but electrochemical additive manufacturing (ECAM) is difficult to print flat and micro structures with random shape immediately. Therein, we applied a new method light-directed electrodeposition and systematically studied the stable and successful electrochemical printing of Ni micro-architectures by using a semiconductor substrate (hydrogenated amorphous silicon, a-Si:H) and supporting electrolyte of Ni<sup>2+</sup> salts at room temperature. The micro manufacturing of Ni succeeds at a high deposition precision up to 5&#xa0;μm, which shows a new pathway to enhance the degrees of freedom of printed structures, opening up new applications where manufacturing flexibility is essential.</p>

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A new method for microscale forming manufacturing of Ni by light-directed electrochemical deposition

  • 期刊论文

  • 发表日期：

    2025年8月9日

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  • Chenghan Zhao,
  • Sen Li,
  • Zibo Di,
  • Wenzheng Wu,
  • Tiantian Li

摘要

Direct electrochemical printing of nickel MEMS components is one of the promising options for improvement, but electrochemical additive manufacturing (ECAM) is difficult to print flat and micro structures with random shape immediately. Therein, we applied a new method light-directed electrodeposition and systematically studied the stable and successful electrochemical printing of Ni micro-architectures by using a semiconductor substrate (hydrogenated amorphous silicon, a-Si:H) and supporting electrolyte of Ni2+ salts at room temperature. The micro manufacturing of Ni succeeds at a high deposition precision up to 5 μm, which shows a new pathway to enhance the degrees of freedom of printed structures, opening up new applications where manufacturing flexibility is essential.