Kinetostatic and dynamic analysis for a new 2-DOF compliant mechanism for potential application in vibration-assisted polishing

Precision systems have extensively employed compliant mechanisms. Nevertheless, its utilization in vibration-assisted polishing has not garnered much interest. Therefore, this study presents a novel framework for a mechanism that adheres to two degrees of freedom. The mechanism that has been constructed exhibits a symmetrical design, enabling it to extract comparable performances in two directions. The proposed construction incorporates a novel combination of a three-lever amplification mechanism and a parallelogram to improve both the stroke and resonant frequency. The output amplification ratio is calculated by the graphical scheme method. The pseudo-rigid-body model, the free-body diagram, and the Lagrange method are all used together in this study to look into kinetostatics and dynamics. The water cycle algorithm is used to conduct structural optimization based on mathematical models. The prototype is fabricated by CNC milling, and physical tests are conducted. According to the findings for the resonant frequency, the analytical results well match the finite element analysis (FEA) results with an error of 8.44%. Besides, the measured resonant frequency was determined approximately 486 Hz, while the FEA yielded a result of 460.4 Hz. The discrepancy between the FEA and experimental results is 5.26%. The utilization of the design mechanism holds promise for the application of vibration-assisted polishing.